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  <titleInfo>
    <title>Lithography</title>
    <subTitle>main techniques</subTitle>
  </titleInfo>
  <name type="personal">
    <namePart>Landis, Stefan.</namePart>
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  <name type="corporate">
    <namePart>ebrary, Inc</namePart>
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  <typeOfResource>text</typeOfResource>
  <genre authority="marc">bibliography</genre>
  <genre authority="local">Electronic books.</genre>
  <originInfo>
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    <place>
      <placeTerm type="text">London</placeTerm>
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    <place>
      <placeTerm type="text">Hoboken, N.J</placeTerm>
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    <publisher>ISTE</publisher>
    <publisher>Wiley</publisher>
    <dateIssued>2011</dateIssued>
    <issuance>monographic</issuance>
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  <language>
    <languageTerm authority="iso639-2b" type="code">eng</languageTerm>
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  <physicalDescription>
    <form authority="marcform">electronic</form>
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    <extent>xxv, 377 p. : ill. (some col.)</extent>
  </physicalDescription>
  <abstract>"Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components"--</abstract>
  <note type="statement of responsibility">edited by Stefan Landis.</note>
  <note>Adapted and updated from Lithography published 2010 in France by Hermes Science/Lavoisier.</note>
  <note>Includes bibliographical references and index.</note>
  <note>Electronic reproduction. Palo Alto, Calif. : ebrary, 2013. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.</note>
  <subject authority="lcsh">
    <topic>Microlithography</topic>
  </subject>
  <classification authority="lcc">TK7872.M3 L58 2011eb</classification>
  <classification authority="ddc" edition="22">621.3815/31</classification>
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