01763nam a2200337 a 4500001001200000003000800012006001900020007001500039008004100054010001700095020002900112020002600141020002700167040002100194035002100215050002600236082002000262245008600282260005300368300003600421500009500457504005100552520043700603533015201040650002201192655002901214700002001243710001701263856012601280999001901406ebr10671590CaPaEBRm        u        cr cn|||||||||101013s2011    enka    sb    001 0 eng d  z  2010040731  z9781848212022 (hardback)  z184821202X (hardback)  z9781118621233 (e-book)  aCaPaEBRcCaPaEBR  a(OCoLC)84285471914aTK7872.M3bL58 2011eb04a621.3815/3122200aLithographyh[electronic resource] :bmain techniques /cedited by Stefan Landis.  aLondon :bISTE ;aHoboken, N.J. :bWiley,c2011.  axxv, 377 p. :bill. (some col.)  aAdapted and updated from Lithography published 2010 in France by Hermes Science/Lavoisier.  aIncludes bibliographical references and index.  a"Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components"--cProvided by publisher.  aElectronic reproduction.bPalo Alto, Calif. :cebrary,d2013.nAvailable via World Wide Web.nAccess may be limited to ebrary affiliated libraries. 0aMicrolithography. 7aElectronic books.2local1 aLandis, Stefan.2 aebrary, Inc.40uhttp://site.ebrary.com/lib/rucke/Doc?id=10671590zAn electronic book accessible through the World Wide Web; click to view  c163541d163541