01338nam a2200349Ia 4500001001200000003000800012006001900020007001500039008004100054010001700095020003900112020002600151040002100177035002100198050002300219082001500242100002300257245014900280250001200429260004600441300002300487504005100510533015200561650003100713650001300744650002200757650002000779655002900799710001700828856012600845999001700971ebr10715316CaPaEBRm     o  u        cr cn|||||||||130422s2013    njua    sb    001 0 eng d  z  2013016209  z9781118062777 (cloth : alk. paper)  z9781118747421 (ebook)  aCaPaEBRcCaPaEBR  a(OCoLC)84119923714aTS695b.K33 2013eb04a620/.52231 aKaariainen, Tommi.10aAtomic layer depositionh[electronic resource] :bprinciples, characteristics, and nanotechnology applications /cTommi Kaariainen ... [et al.].  a2nd ed.  aHoboken, NJ :bJohn Wiley & Sons,cc2013.  axv, 253 p. :bill.  aIncludes bibliographical references and index.  aElectronic reproduction.bPalo Alto, Calif. :cebrary,d2013.nAvailable via World Wide Web.nAccess may be limited to ebrary affiliated libraries. 0aChemical vapor deposition. 0aEpitaxy. 0aMicroelectronics. 0aNanotechnology. 7aElectronic books.2local2 aebrary, Inc.40uhttp://site.ebrary.com/lib/rucke/Doc?id=10715316zAn electronic book accessible through the World Wide Web; click to view  c40842d40842