01761nam a2200373Ia 4500001001200000003000800012006001900020007001500039008004100054020001500095040002100110035002000131050002300151082001600174245021100190260005500401300001300456490002500469500003900494500015500533533015200688650002400840650002900864650002000893655002900913700002900942710006700971710006001038710010301098710001701201830002601218856012601244999001701370ebr10071430CaPaEBRm        u        cr cn|||||||||050323s1995    dcu     s     000 0 eng d  z0309575168  aCaPaEBRcCaPaEBR  a(OCoLC)5856701014aTA2020b.P5 1995eb04a621.04422200aPlasma processing and processing scienceh[electronic resource] /cPanel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.  aWashington, D.C. :bNational Academy Press,c1995.  ax, 35 p.1 aNRL strategic series  aCommittee chair:  Francis F. Chen.  aThis work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.  aElectronic reproduction.bPalo Alto, Calif. :cebrary,d2009.nAvailable via World Wide Web.nAccess may be limited to ebrary affiliated libraries. 0aPlasma engineering. 0aSemiconductorsxEtching. 0aPlasma etching. 7aElectronic books.2local1 aChen, Francis F.,d1929-2 aNational Research Council (U.S.).bPanel on Plasma Processing.2 aNational Research Council (U.S.).bNaval Studies Board.2 aNational Research Council (U.S.).bCommission on Physical Sciences, Mathematics, and Applications.2 aebrary, Inc. 0aNRL strategic series.40uhttp://site.ebrary.com/lib/rucke/Doc?id=10071430zAn electronic book accessible through the World Wide Web; click to view  c43531d43531