Silicon technologies
ion implantation and thermal treatment
Baudrant, Annie.
ebrary, Inc
text
bibliography
Electronic books.
enk
London
Hoboken, N.J
ISTE
Wiley
2011
monographic
eng
xvii, 337 p. : ill.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
edited by Annie Baudrant.
Includes bibliographical references and index.
Electronic reproduction. Palo Alto, Calif. : ebrary, 2015. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.
Semiconductor doping
Ion implantation
Semiconductors
Heat treatment
TK7871.85 .S5485 2011eb
621.3815/2
http://site.ebrary.com/lib/rucke/Doc?id=10660607
http://site.ebrary.com/lib/rucke/Doc?id=10660607
CaPaEBR
110316
ebr10660607