TY  - BOOK
AU  - He,Gang
AU  - Sun,Zhaoqi
ED  - ebrary, Inc.
TI  - High-k gate dielectrics for CMOS technology
AV  - QC585 .H54 2012eb
U1  - 538.24 23
PY  - 2012///
CY  - Weinheim
PB  - Wiley-VCH
KW  - Dielectrics
KW  - Metal oxide semiconductors, Complementary
KW  - Electronic books
KW  - local
N1  - Includes bibliographical references and index; pt. 1. Scaling and challenging of Si-based CMOS -- pt. 2. High-k deposition and materials characterization -- pt. 3. Challenge in interface engineering and electrode -- pt. 4. Development in non-Si-based CMOS technology -- pt. 5. High-k Application in novel devices -- pt. 6. Challenge and directions; Electronic reproduction; Palo Alto, Calif.; ebrary; 2013; Available via World Wide Web; Access may be limited to ebrary affiliated libraries
UR  - http://site.ebrary.com/lib/rucke/Doc?id=10653595
ER  -