000			01362nam a2200361 a 4500
001			ebr10422412
003			CaPaEBR
006			m u
007			cr cn|||||||||
008			100105s2009 njua sb 001 0 eng d
010			_z 2010275010
020			_z9789812837622
020			_z9812837620
020			_z9789812837639 (e-book)
040			_aCaPaEBR _cCaPaEBR
035			_a(OCoLC)613386751
050	1	4	_aQH212.S33 _bG57 2009eb
082	0	4	_a530.4/275 _222
100	1		_aGnecco, Enrico.
245	1	0	_aNanoscale processes on insulating surfaces _h[electronic resource] / _cEnrico Gnecco, Marek Szymonski.
260			_aSingapore ; _aHackensack, N.J. : _bWorld Scientific, _cc2009.
300			_axiv, 186 p. : _bill.
504			_aIncludes bibliographical references (p. 163-181) and index.
533			_aElectronic reproduction. _bPalo Alto, Calif. : _cebrary, _d2013. _nAvailable via World Wide Web. _nAccess may be limited to ebrary affiliated libraries.
650		0	_aScanning probe microscopy.
650		0	_aNanoelectronics.
650		0	_aIonic crystals.
650		0	_aThin films _xSurfaces.
655		7	_aElectronic books. _2local
700	1		_aSzymo�nski, Marek.
710	2		_aebrary, Inc.
856	4	0	_uhttp://site.ebrary.com/lib/rucke/Doc?id=10422412 _zAn electronic book accessible through the World Wide Web; click to view
999			_c142068 _d142068