000 01454nam a2200373Ia 4500
001 ebr10419114
003 CaPaEBR
006 m u
007 cr cn|||||||||
008 091215s2010 enka sb 001 0 eng d
020 _z9780470596975
020 _z047059697X
040 _aCaPaEBR
_cCaPaEBR
035 _a(OCoLC)689995793
050 1 4 _aTK7872.M3
_bM3 2010eb
082 0 4 _a621.381531
_222
100 1 _aMa, Xu,
_d1983-
245 1 0 _aComputational lithography
_h[electronic resource] /
_cXu Ma and Gonzalo R. Arce.
260 _aOxford :
_bWiley-Blackwell,
_c2010.
300 _axv, 226 p. :
_bill.
490 1 _aWiley series in pure and applied optics
504 _aIncludes bibliographical references and index.
533 _aElectronic reproduction.
_bPalo Alto, Calif. :
_cebrary,
_d2011.
_nAvailable via World Wide Web.
_nAccess may be limited to ebrary affiliated libraries.
650 0 _aMicrolithography
_xMathematics.
650 0 _aIntegrated circuits
_xDesign and construction
_xMathematics.
650 0 _aPhotolithography
_xMathematics.
650 0 _aSemiconductors
_xEtching
_xMathematics.
650 0 _aResolution (Optics)
655 7 _aElectronic books.
_2local
700 1 _aArce, Gonzalo R.
710 2 _aebrary, Inc.
830 0 _aWiley series in pure and applied optics.
856 4 0 _uhttp://site.ebrary.com/lib/rucke/Doc?id=10419114
_zAn electronic book accessible through the World Wide Web; click to view
999 _c185489
_d185489