000 01338nam a2200349Ia 4500
001 ebr10715316
003 CaPaEBR
006 m o u
007 cr cn|||||||||
008 130422s2013 njua sb 001 0 eng d
010 _z 2013016209
020 _z9781118062777 (cloth : alk. paper)
020 _z9781118747421 (ebook)
040 _aCaPaEBR
_cCaPaEBR
035 _a(OCoLC)841199237
050 1 4 _aTS695
_b.K33 2013eb
082 0 4 _a620/.5
_223
100 1 _aKaariainen, Tommi.
245 1 0 _aAtomic layer deposition
_h[electronic resource] :
_bprinciples, characteristics, and nanotechnology applications /
_cTommi Kaariainen ... [et al.].
250 _a2nd ed.
260 _aHoboken, NJ :
_bJohn Wiley & Sons,
_cc2013.
300 _axv, 253 p. :
_bill.
504 _aIncludes bibliographical references and index.
533 _aElectronic reproduction.
_bPalo Alto, Calif. :
_cebrary,
_d2013.
_nAvailable via World Wide Web.
_nAccess may be limited to ebrary affiliated libraries.
650 0 _aChemical vapor deposition.
650 0 _aEpitaxy.
650 0 _aMicroelectronics.
650 0 _aNanotechnology.
655 7 _aElectronic books.
_2local
710 2 _aebrary, Inc.
856 4 0 _uhttp://site.ebrary.com/lib/rucke/Doc?id=10715316
_zAn electronic book accessible through the World Wide Web; click to view
999 _c40842
_d40842