000			01761nam a2200373Ia 4500
001			ebr10071430
003			CaPaEBR
006			m u
007			cr cn|||||||||
008			050323s1995 dcu s 000 0 eng d
020			_z0309575168
040			_aCaPaEBR _cCaPaEBR
035			_a(OCoLC)58567010
050	1	4	_aTA2020 _b.P5 1995eb
082	0	4	_a621.044 _222
245	0	0	_aPlasma processing and processing science _h[electronic resource] / _cPanel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.
260			_aWashington, D.C. : _bNational Academy Press, _c1995.
300			_ax, 35 p.
490	1		_aNRL strategic series
500			_aCommittee chair: Francis F. Chen.
500			_aThis work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
533			_aElectronic reproduction. _bPalo Alto, Calif. : _cebrary, _d2009. _nAvailable via World Wide Web. _nAccess may be limited to ebrary affiliated libraries.
650		0	_aPlasma engineering.
650		0	_aSemiconductors _xEtching.
650		0	_aPlasma etching.
655		7	_aElectronic books. _2local
700	1		_aChen, Francis F., _d1929-
710	2		_aNational Research Council (U.S.). _bPanel on Plasma Processing.
710	2		_aNational Research Council (U.S.). _bNaval Studies Board.
710	2		_aNational Research Council (U.S.). _bCommission on Physical Sciences, Mathematics, and Applications.
710	2		_aebrary, Inc.
830		0	_aNRL strategic series.
856	4	0	_uhttp://site.ebrary.com/lib/rucke/Doc?id=10071430 _zAn electronic book accessible through the World Wide Web; click to view
999			_c43531 _d43531