000 01245nam a2200301Ia 4500
001 ebr10325826
003 CaPaEBR
006 m u
007 cr cn|||||||||
008 081027s2009 si a sb 001 0 eng d
010 _z 2008045600
020 _z9780470824078 (cloth)
040 _aCaPaEBR
_cCaPaEBR
035 _a(OCoLC)669008259
050 1 4 _aTK7871.99.M44
_bK47 2009eb
100 1 _aKer, Ming-Dou.
245 1 0 _aTransient-induced latchup in CMOS integrated circuits
_h[electronic resource] /
_cMing-Dou Ker and Sheng-Fu Hsu.
260 _aSingapore ;
_aHoboken, NJ :
_bWiley,
_cc2009.
300 _axiii, 249 p. :
_bill.
504 _aIncludes bibliographical references and index.
533 _aElectronic reproduction.
_bPalo Alto, Calif. :
_cebrary,
_d2009.
_nAvailable via World Wide Web.
_nAccess may be limited to ebrary affiliated libraries.
650 0 _aMetal oxide semiconductors, Complementary
_xDefects.
650 0 _aMetal oxide semiconductors, Complementary
_xReliability.
655 7 _aElectronic books.
_2local
700 1 _aHsu, Sheng-Fu.
710 2 _aebrary, Inc.
856 4 0 _uhttp://site.ebrary.com/lib/rucke/Doc?id=10325826
_zAn electronic book accessible through the World Wide Web; click to view
999 _c54156
_d54156