000			01568nam a2200385 a 4500
001			ebr10675006
003			CaPaEBR
006			m u
007			cr cn|||||||||
008			100506s2010 nyuad sb 001 0 eng d
010			_z 2010016713
020			_z9781616687496 (softcover)
020			_z9781617283185 (e-book)
040			_aCaPaEBR _cCaPaEBR
035			_a(OCoLC)711000608
050	1	4	_aTK7871.15.F5 _bR44 2010eb
082	0	4	_a621.381 _222
100	1		_aRee, Moonhor.
245	1	0	_aLow-k nanoporous interdielectrics _h[electronic resource] : _bmaterials, thin film fabrications, structures and properties / _cMoonhor Ree, Jinhwan Yoon and Kyuyoung Heo.
260			_aHauppauge, N.Y. : _bNova Science Publishers, _cc2010.
300			_a67 p. : _bill.
490	1		_aNanotechnology science and technology
504			_aIncludes bibliographical references (p. [51]-61) and index.
533			_aElectronic reproduction. _bPalo Alto, Calif. : _cebrary, _d2013. _nAvailable via World Wide Web. _nAccess may be limited to ebrary affiliated libraries.
650		0	_aDielectric films.
650		0	_aMicroelectronics _xMaterials.
650		0	_aPorous materials.
650		0	_aInterconnects (Integrated circuit technology)
655		7	_aElectronic books. _2local
700	1		_aYoon, Jinhwan.
700	1		_aHeo, Kyuyoung.
710	2		_aebrary, Inc.
830		0	_aNanotechnology science and technology series.
856	4	0	_uhttp://site.ebrary.com/lib/rucke/Doc?id=10675006 _zAn electronic book accessible through the World Wide Web; click to view
999			_c57372 _d57372