000 01252nam a2200289Ia 4500
001 ebr10570978
003 CaPaEBR
006 m u
007 cr cn|||||||||
008 120813s2012 ts a sb 001 0 eng d
020 _z9781608053599
040 _aCaPaEBR
_cCaPaEBR
035 _a(OCoLC)811371628
050 1 4 _aTK7871.85
_b.W65 2012eb
100 1 _aWong, Terence K. S.
245 1 0 _aSemiconductor strain metrology
_h[electronic resource] :
_bprinciples and applications /
_cTerence K.S. Wong.
260 _a[Saif Zone, Sharjah, U.A.E] ;
_aOak Park, IL :
_bBentham Science,
_c[2012]
300 _a136 p. :
_bill.
504 _aIncludes bibliographical references and index.
533 _aElectronic reproduction.
_bPalo Alto, Calif. :
_cebrary,
_d2011.
_nAvailable via World Wide Web.
_nAccess may be limited to ebrary affiliated libraries.
650 0 _aSemiconductors
_xDesign and construction
_xMaterials.
650 0 _aCompound semiconductors
_xDesign and construction
_xMaterials.
650 0 _aSilicon-on-insulator technology.
655 7 _aElectronic books.
_2local
710 2 _aebrary, Inc.
856 4 0 _uhttp://site.ebrary.com/lib/rucke/Doc?id=10570978
_zAn electronic book accessible through the World Wide Web; click to view
999 _c80757
_d80757