Silicon technologies
Silicon technologies ion implantation and thermal treatment / [electronic resource] :
edited by Annie Baudrant.
- London : Hoboken, N.J. : ISTE ; Wiley, 2011.
- xvii, 337 p. : ill.
Includes bibliographical references and index.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Electronic reproduction.
Palo Alto, Calif. :
ebrary,
2015.
Available via World Wide Web.
Access may be limited to ebrary affiliated libraries.
Semiconductor doping.
Ion implantation.
Semiconductors--Heat treatment.
Electronic books.
TK7871.85 / .S5485 2011eb
621.3815/2
Includes bibliographical references and index.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Electronic reproduction.
Palo Alto, Calif. :
ebrary,
2015.
Available via World Wide Web.
Access may be limited to ebrary affiliated libraries.
Semiconductor doping.
Ion implantation.
Semiconductors--Heat treatment.
Electronic books.
TK7871.85 / .S5485 2011eb
621.3815/2