Computational lithography (Record no. 185489)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01454nam a2200373Ia 4500 |
| 082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381531 |
| 100 1# - MAIN ENTRY--AUTHOR NAME | |
| Personal name | Ma, Xu, |
| 245 10 - TITLE STATEMENT | |
| Title | Computational lithography |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication | Oxford : |
| Name of publisher | Wiley-Blackwell, |
| Year of publication | 2010. |
| 300 ## - PHYSICAL DESCRIPTION | |
| Number of Pages | xv, 226 p. : |
| Other physical details | ill. |
| 490 1# - SERIES STATEMENT | |
| Series statement | Wiley series in pure and applied optics |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical Term | Microlithography |
| Topical Term | Integrated circuits |
| Topical Term | Photolithography |
| Topical Term | Semiconductors |
| Topical Term | Resolution (Optics) |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Arce, Gonzalo R. |
| 856 40 - ELECTRONIC LOCATION AND ACCESS | |
| Uniform Resource Identifier | http://site.ebrary.com/lib/rucke/Doc?id=10419114 |
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