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Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.

By: Contributor(s): Material type: TextSeries: Wiley series in pure and applied opticsPublication details: Oxford : Wiley-Blackwell, 2010.Description: xv, 226 p. : illSubject(s): Genre/Form: DDC classification:
  • 621.381531 22
LOC classification:
  • TK7872.M3 M3 2010eb
Online resources:
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Includes bibliographical references and index.

Electronic reproduction. Palo Alto, Calif. : ebrary, 2011. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.

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