Plasma processing and processing science (Record no. 43531)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01761nam a2200373Ia 4500 |
| 082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.044 |
| 245 00 - TITLE STATEMENT | |
| Title | Plasma processing and processing science |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication | Washington, D.C. : |
| Name of publisher | National Academy Press, |
| Year of publication | 1995. |
| 300 ## - PHYSICAL DESCRIPTION | |
| Number of Pages | x, 35 p. |
| 490 1# - SERIES STATEMENT | |
| Series statement | NRL strategic series |
| 500 ## - GENERAL NOTE | |
| General note | Committee chair: Francis F. Chen. |
| General note | This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124. |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical Term | Plasma engineering. |
| Topical Term | Semiconductors |
| Topical Term | Plasma etching. |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Chen, Francis F., |
| 856 40 - ELECTRONIC LOCATION AND ACCESS | |
| Uniform Resource Identifier | http://site.ebrary.com/lib/rucke/Doc?id=10071430 |
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